André Weill: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Characterization of the development of DNQ/novolac resists by surface energy measurements

Fadda, Emilienne, Amblard, Gilles R., Weill, Andre P., Prola, Alain, Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 336 KB

english, 1994

2

French Book Production From 1454: A Quantative Analysis

Ladurie, Emmanuel Le Roy, Smedley-Weill, Anette, Zysberg, André

Journal:

Library History

Year:

1999

Language:

english

File:

PDF, 1.56 MB

english, 1999

3

Effets de certains additifs sur i'extrudabilité du polypropylène

André Hinschberger, André Weill, Jacky Tarnat

Journal:

Macromolecular Materials and Engineering

Year:

1976

File:

PDF, 568 KB

1976

4

The novolak calibration method applied to the GPC analysis of the UV photoresists

Patrick Paniez, André Weill

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 598 KB

english, 1986

5

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Flare impact on the intrafield CD control for sub-0.25-μm patterning

Luce, Emmanuelle, Minghetti, Blandine, Schiavone, Patrick, Toublan, Olivier, Weill, Andre P., Van den Hove, Luc

Year:

1999

Language:

english

File:

PDF, 3.95 MB

english, 1999

6

[IEEE 2016 IEEE International Conference on Big Data (Big Data) - Washington DC,USA (2016.12.5-2016.12.8)] 2016 IEEE International Conference on Big Data (Big Data) - Deep learning in the automotive industry: Applications and tools

Luckow, Andre, Cook, Matthew, Ashcraft, Nathan, Weill, Edwin, Djerekarov, Emil, Vorster, Bennie

Year:

2016

Language:

english

File:

PDF, 252 KB

english, 2016

7

Ruptured Isolated Spinal Artery Aneurysms Report of Two Cases and Review of the Literature

Romero, Diego Gutierrez, Batista, Andre Lima, Gentric, Jean Christoph, Raymond, Jean, Roy, Daniel, Weill, Alain

Journal:

Interventional Neuroradiology

Year:

2014

Language:

english

File:

PDF, 164 KB

english, 2014

8

[IEEE 2018 IEEE International Conference on Big Data (Big Data) - Seattle, WA, USA (2018.12.10-2018.12.13)] 2018 IEEE International Conference on Big Data (Big Data) - Artificial Intelligence and Deep Learning Applications for Automotive Manufacturing

Luckow, Andre, Kennedy, Ken, Ziolkowski, Marcin, Djerekarov, Emil, Cook, Matthew, Duffy, Edward, Schleiss, Michael, Vorster, Bennie, Weill, Edwin, Kulshrestha, Ankit, Smith, Melissa C

Year:

2018

File:

PDF, 10 KB

2018

9

Dipole–dipole interaction and the relative stability of different types of aggregates of helical polypeptides

G. Weill, J. J. André

Journal:

Year:

1978

Language:

english

File:

PDF, 195 KB

english, 1978

10

Cinétique de la diffusion de l'eau dans un film mince de photoresist

Franc̨ois Sebillote, André Weill, Patrick Paniez

Journal:

Macromolecular Chemistry and Physics

Year:

1985

File:

PDF, 199 KB

1985

11

Magnetic and optical properties of chloranil anion salts in the solid state

J.J. Andre, G. Weill

Journal:

Chemical Physics Letters

Year:

1971

Language:

english

File:

PDF, 332 KB

english, 1971

12

Three-stage melting of an annelide-type copper complex. A new type of organized phase: Tegma crystals

Dimitra Markovitsi, Jean-Jacques Andre, André Mathis, Jacques Simon, Pierre Spegt, Gilbert Weill, Martine Ziliox

Journal:

Chemical Physics Letters

Year:

1984

Language:

english

File:

PDF, 409 KB

english, 1984

13

Photoresist spin coating mechanism related to polymer solution rheology

Andre Weill, Jean Marc Francou, Elisabeth Dechenaux

Journal:

Microelectronic Engineering

Year:

1987

Language:

english

File:

PDF, 232 KB

english, 1987

14

E-beam patterning by a double exposure process

Frédéric Lalanne, André Weill, Gilles Amblard, Jean Pierre Panabiere

Journal:

Microelectronic Engineering

Year:

1991

Language:

english

File:

PDF, 332 KB

english, 1991

15

Diffusion phenomenon and loss of adhesion in chemically amplified negative resists

Gilles Amblard, Alain Inard, André Weill, Frédéric Lalanne, Jean Pierre Panabiere

Journal:

Microelectronic Engineering

Year:

1992

Language:

english

File:

PDF, 392 KB

english, 1992

16

Resist polarity changes during the silylation process

André Weill, Gilles Amblard, Françoise Debaene, Daniel Sage

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 332 KB

english, 1993

17

Variable numerical aperture and partial coherence studies: Process window and proximity effects

Sandrine André, André Weill

Journal:

Microelectronic Engineering

Year:

1996

Language:

english

File:

PDF, 311 KB

english, 1996

18

Induction des autoanticorps au cours des spondylarthropathies réfractaires traitées par infliximab en association au méthotrexate

Jérémie Sellam, Yannick Allanore, Frédéric Batteux, Chantal Job Deslandre, Bernard Weill, André Kahan

Journal:

Revue du Rhumatisme

Year:

2005

File:

PDF, 146 KB

2005

19

Magnetic structures of some strongly correlated electron Ce-Ni-Ge systems

L. Durivault, F. Bourée, B. Chevalier, G. André, F. Weill, J. Etourneau

Journal:

Applied Physics A: Materials Science & Processing

Year:

2002

Language:

english

File:

PDF, 188 KB

english, 2002

20

Clinical significance of anti-Ro52 (TRIM21) antibodies non-associated with anti-SSA 60 kDa antibodies: Results of a multicentric study

P. Ghillani, C. André, C. Toly, A.M. Rouquette, D. Bengoufa, P. Nicaise, C. Goulvestre, A. Gleizes, M.A. Dragon-Durey, M.A. Alyanakian, P. Chretien, S. Chollet-Martin, L. Musset, B. Weill, C. Johanet

Journal:

Autoimmunity Reviews

Year:

2011

Language:

english

File:

PDF, 331 KB

english, 2011

21

Autoantibody induction in patients with refractory spondyloarthropathy treated with infliximab and methotrexate

Jérémie Sellam, Yannick Allanore, Frédéric Batteux, Chantal Job Deslandre, Bernard Weill, André Kahan

Journal:

Joint Bone Spine

Year:

2005

Language:

english

File:

PDF, 141 KB

english, 2005

22

In vitro metabolism of dehydroepiandrosterone (DHEA) to 7α-hydroxy-DHEA and Δ5-androstene-3β,17β-diol in specific regions of the aging brain from Alzheimer’s and non-demented patients

Sébastien Weill-Engerer, Jean-Philippe David, Véronique Sazdovitch, Philippe Liere, Michael Schumacher, André Delacourte, Etienne-Emile Baulieu, Yvette Akwa

Journal:

Year:

2003

Language:

english

File:

PDF, 453 KB

english, 2003

23

Electroencephalography in clinical practice: Robert S. Schwab, M.D. W.S. Saunders Co., Philadelphia — London, 1951, 195 pp. $6.50

Journal:

Electroencephalography and Clinical Neurophysiology

Year:

1952

Language:

english

File:

PDF, 154 KB

english, 1952

24

Crystal chemistry of the G-phases in the systems Ti–{Fe, Co, Ni}–Al with a novel filled variant of the Th6Mn23-type

Andriy Grytsiv, Jin Jun Ding, Peter Rogl, François Weill, Bernard Chevalier, Jean Etourneau, Gilles André, Françoise Bourée, Henri Noël, Peter Hundegger, Günter Wiesinger

Journal:

Year:

2003

Language:

english

File:

PDF, 346 KB

english, 2003

25

GENE-DOSAGE EFFECTS ON FITNESS IN RECENT ADAPTIVE DUPLICATIONS: ace-1 IN THE MOSQUITO CULEX PIPIENS

Labbé, Pierrick, Milesi, Pascal, Yébakima, André, Pasteur, Nicole, Weill, Mylène, Lenormand, Thomas

Journal:

Year:

2014

Language:

english

File:

PDF, 400 KB

english, 2014

26

Neurosteroid Quantification in Human Brain Regions: Comparison between Alzheimer’s and Nondemented Patients

Weill-Engerer, Sébastien, David, Jean-Philippe, Sazdovitch, Véronique, Liere, Philippe, Eychenne, Bernard, Pianos, Antoine, Schumacher, Michael, Delacourte, André, Baulieu, Etienne-Emile, Akwa, Yvette

Journal:

Journal of Clinical Endocrinology & Metabolism

Year:

2002

Language:

english

File:

PDF, 208 KB

english, 2002

27

Optical spectrum of the chloranil radical anion

Andre, J.J., Weill, G.

Journal:

Molecular Physics

Year:

1968

Language:

english

File:

PDF, 104 KB

english, 1968

28

Incommensurate and commensurate magnetic structures of the ternary germanide CeNiGe 3

Durivault, L, Bour e, F, Chevalier, B, Andr , G, Weill, F, Etourneau, J, Martinez-Samper, P, Rodrigo, J G, Suderow, H, Vieira, S

Journal:

Journal of Physics Condensed Matter

Year:

2003

Language:

english

File:

PDF, 863 KB

english, 2003

29

Electron Spin Resonance of Highly Anisotroic Organic Systems

Weill, G., Andre, J. J., Bieber, A.

Journal:

Molecular Crystals and Liquid Crystals

Year:

1978

Language:

english

File:

PDF, 1017 KB

english, 1978

30

Quantitative Real-Time Legionella PCR for Environmental Water Samples: Data Interpretation

Joly, P., Falconnet, P.-A., Andre, J., Weill, N., Reyrolle, M., Vandenesch, F., Maurin, M., Etienne, J., Jarraud, S.

Journal:

Applied and Environmental Microbiology

Year:

2006

Language:

english

File:

PDF, 122 KB

english, 2006

31

Calciseptine, a Peptide Isolated From Black Mamba Venom, is a Specific Blocker of the L-Type Calcium Channel

Jan R. de Weille, Hugues Schweitz, Pierrette Maes, Andre Tartar and Michel Lazdunski

Journal:

Proceedings of the National Academy of Sciences

Year:

1991

Language:

english

File:

PDF, 842 KB

english, 1991

32

Treatment of Brain AVMs (TOBAS): study protocol for a pragmatic randomized controlled trial

Darsaut, Tim E., Magro, Elsa, Gentric, Jean-Christophe, Batista, André Lima, Chaalala, Chiraz, Roberge, David, Bojanowski, Michel W., Weill, Alain, Roy, Daniel, Raymond, Jean

Journal:

Year:

2015

Language:

english

File:

PDF, 891 KB

english, 2015

33

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Latitude of the BAR process compared to the monolayer and TAR processes for 0.35-μm design rules at gate level

Andre, Sandrine, Weill, Andre P., Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 446 KB

english, 1996

34

SPIE Proceedings [SPIE Hague International Symposium - The Hague, Netherlands (Monday 30 March 1987)] Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection - Characterization of commercial dyes for PMMA bilayer systems

Paniez, Patrick J., Amblard, Gilles R., Dechenaux, Elisabeth C., Weill, Andre P., Stover, Harry L., Wittekoek, Stefan

Year:

1987

Language:

english

File:

PDF, 6.57 MB

english, 1987

35

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - CVD photoresist performance for 248-nm lithography

Monget, Cedric, Joubert, Olivier P., Weidman, Timothy W., Toublan, Olivier, Panabiere, Jean-Pierre, Weill, Andre P., Conley, Will

Year:

1999

Language:

english

File:

PDF, 1.19 MB

english, 1999

36

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Integrated Circuit Metrology, Inspection, and Process Control IX - Charge effect elimination for automatic CD inspection of 0.4-μm contact holes in resist

Romand, Philippe, Panabiere, Jean-Pierre, Andre, Sandrine, Weill, Andre P., Bennett, Marylyn H.

Year:

1995

Language:

english

File:

PDF, 247 KB

english, 1995

37

SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Dry development of silylated resist: influence of substrate temperature

Joubert, Olivier P., Rouyer, Claude, Pons, Michel J., Weill, Andre P., Paniez, Patrick J., Novembre, Anthony E.

Year:

1992

Language:

english

File:

PDF, 550 KB

english, 1992

38

SPIE Proceedings [SPIE Micro - DL tentative - San Jose, CA (Friday 1 March 1991)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing - Wet-developed, high-aspect-ratio resist patterns by 20-keV e-beam lithography

Weill, Andre P., Amblard, Gilles R., Lalanne, Frederic P., Panabiere, Jean-Pierre, Peckerar, Martin C.

Year:

1991

Language:

english

File:

PDF, 446 KB

english, 1991

39

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Role of surface tension in silylation processes

Weill, Andre P., Paniez, Patrick J., Joubert, Olivier P., Debaene, Francoise, Sage, Daniel, Amblard, Gilles R., Pons, Michel J., Hinsberg, William D.

Year:

1993

Language:

english

File:

PDF, 276 KB

english, 1993

40

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Physical aging of resists: the continual evolution of lithographic material

Paniez, Patrick J., Weill, Andre P., Cohendoz, Stephane D., Ito, Hiroshi

Year:

1991

Language:

english

File:

PDF, 393 KB

english, 1991

41

SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II - Comparative evaluation of e-beam charge reducing processes

Amblard, Gilles R., Guerin, Laurent A., Lalanne, Frederic P., Panabiere, Jean-Pierre, Guillaume, Michel E., Romand, Philippe, Weill, Andre P., Peckerar, Martin C.

Year:

1992

Language:

english

File:

PDF, 281 KB

english, 1992

42

SPIE Proceedings [SPIE Microelectronic Processing '92 - San Jose, CA (Sunday 20 September 1992)] Advanced Techniques for Integrated Circuit Processing II - New dry-development process of trilayer resist systems for advanced lithography

Joubert, Olivier P., Martinet, C., Pelletier, Jacques H., Pons, Michel J., Francou, Jean-Marc, Panabiere, Jean-Pierre, Weill, Andre P., Tedesco, Serge V., Vinet, Francoise, Mourier, Thierry, Bondur, J

Year:

1993

Language:

english

File:

PDF, 903 KB

english, 1993

43

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Dry development and plasma durability of resists: melt viscosity and self-diffusion effects

Paniez, Patrick J., Joubert, Olivier P., Pons, Michel J., Oberlin, Jean C., Weill, Andre P., Ito, Hiroshi

Year:

1991

Language:

english

File:

PDF, 517 KB

english, 1991

44

Paramagnétisme de Complexes à Transfert de Charge Macromoléculaires

Andre, J. J., Weill, G.

Journal:

Journal of Polymer Science Part C Polymer Symposia

Year:

1967

File:

PDF, 684 KB

1967

45

SPIE Proceedings [SPIE 1989 Intl Congress on Optical Science and Engineering - Paris, France (Monday 24 April 1989)] Optical Microlithography and Metrology for Microcircuit Fabrication - A Negative Aqueous Developable Electron-Beam Resist Under Deep UV Exposure

Amblard, Gilles, Francou, J. Marc, Weill, Andre, Panabiere, J. Pierre, Lacombat, Michel J., Wittekoek, Stefan

Year:

1989

Language:

english

File:

PDF, 6.21 MB

english, 1989

46

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Advanced i-line lithography: evaluation of a new chemical amplification negative resist

Amblard, Gilles R., Weill, Andre P., Brault, Christophe M., Hinsberg, William D.

Year:

1993

Language:

english

File:

PDF, 726 KB

english, 1993

47

SPIE Proceedings [SPIE Microelectronic Processing '92 - San Jose, CA (Sunday 20 September 1992)] Advanced Techniques for Integrated Circuit Processing II - Plasma etching of silylated photoresist: a study of mechanisms

Joubert, Olivier P., Pons, Michel J., Debaene, Francoise, Weill, Andre P., Bondur, James A., Castleman, Gary, Harriott, Lloyd R., Turner, Terry R.

Year:

1993

Language:

english

File:

PDF, 890 KB

english, 1993

48

SPIE Proceedings [SPIE 1988 Microlithography Conferences - Santa Clara, CA, United States (Wednesday 2 March 1988)] Optical/Laser Microlithography - Subhalfmicronic Contact Printing Lithography Using A Microwave Powered Deep UV Source

Weill, Andre P., Francou, Jean-Marc, Panabiere, Jean-Pierre, Lin, Burn J.

Year:

1988

Language:

english

File:

PDF, 7.79 MB

english, 1988

49

SPIE Proceedings [SPIE Hague International Symposium - The Hague, Netherlands (Monday 30 March 1987)] Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection - Bilevel System HPR/PMMA

Weill, Andre P., Dechenaux, Elisabeth C., Paniez, Patrick J., Amblard, Gilles R., Stover, Harry L., Wittekoek, Stefan

Year:

1987

Language:

english

File:

PDF, 19.20 MB

english, 1987

50

Early CT changes in patients admitted for thrombectomy

Farzin, Behzad, Fahed, Robert, Guilbert, Francois, Poppe, Alexandre Y., Daneault, Nicole, Durocher, André P., Lanthier, Sylvain, Boudjani, Hayet, Khoury, Naim N., Roy, Daniel, Weill, Alain, Gentric, J

Journal:

Year:

2016

Language:

english

File:

PDF, 954 KB

english, 2016